发明名称 半導体装置
摘要 An aperture ratio of a semiconductor device is improved. A driver circuit and a pixel are provided over one substrate, and a first thin film transistor in the driver circuit and a second thin film transistor in the pixel each include a gate electrode layer, a gate insulating layer over the gate electrode layer, an oxide semiconductor layer over the gate insulating layer, source and drain electrode layers over the oxide semiconductor layer, and an oxide insulating layer in contact with part of the oxide semiconductor layer over the gate insulating layer, the oxide semiconductor layer, and the source and drain electrode layers. The gate electrode layer, the gate insulating layer, the oxide semiconductor layer, the source and drain electrode layers, and the oxide insulating layer of the second thin film transistor each have a light-transmitting property.
申请公布号 JP5714141(B2) 申请公布日期 2015.05.07
申请号 JP20140000899 申请日期 2014.01.07
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平;坂田 淳一郎;三宅 博之;桑原 秀明;高橋 辰也
分类号 H01L29/786;G02F1/1345;H01L21/336;H01L51/50;H05B33/14 主分类号 H01L29/786
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