MULTI-CELL RESONATOR MICROWAVE SURFACE-WAVE PLASMA APPARATUS

摘要

A processing system is disclosed, having a multiple power transmission elements with an interior cavity that may be arranged around a plasma processing chamber. Each of the power transmission elements may propagates electromagnetic energy that may be used to generate plasma within the plasma process chamber. The power transmission elements may be designed to accommodate a range of power and frequency ranges that range from 500W to 3500W and 0.9 GHz to 9 GHz. In one embodiment, the power transmission elements may include a rectangular interior cavity that enables the generation of a standing wave with two or more modes. In another embodiment, the power transmission elements may have a cylindrical interior cavity that may be placed along the plasma processing chamber or have one end of the cylinder placed against the plasma processing chamber.

主权项

1. A plasma processing system for processing semiconductor substrates, comprising:
a plasma chamber comprising a substrate holder; a plurality of power transmission elements arranged around the plasma chamber, the power transmission elements comprising:
an interior cavity to propagate microwave frequency electromagnetic waves; anda gap along the interior cavity that forms an opening between the interior cavity and plasma chamber; an antenna coupled to the power transmission elements; and a dielectric component that limits fluid communication between the interior cavity and the plasma chamber.