| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent an increase in treatment liquid concentration due to treatment liquid replenishment. <P>SOLUTION: A substrate processing device (1) for adjusting treatment liquid concentration to saturation concentration at a preset temperature by boiling the treatment liquid obtained by diluting the chemical with a dilution liquid at the preset temperature and processing a substrate by immersing it in the treatment liquid comprises: a processing tank (2) for processing a substrate (10) with the treatment liquid; treatment liquid heating means (5) for heating the treatment liquid accumulated in the processing tank (2) to the preset temperature; treatment liquid discharge means (6) for discharging the treatment liquid from the processing tank (2); treatment liquid replenishment means (7) for replenishing the processing tank (2) with the treatment liquid; preset temperature changing means (8) for changing the preset temperature; and control means (9) for controlling the treatment liquid discharge means (6) and the treatment liquid replenishment means (7). The control means (9) controls the treatment liquid so that the treatment liquid discharge means (6) discharges a predetermined amount of the treatment liquid from the processing tank (2) and the treatment liquid replenishment means (7) replenishes the processing tank (2) with the treatment liquid of saturation concentration at the preset temperature changed by the preset temperature changing means (8). <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
