发明名称 研磨装置
摘要 <p>Provided is a polishing apparatus capable of maintaining polishing precision although fewer expendable parts are periodically replaced. The polishing apparatus includes a polishing disk (20) having a polishing surface (20a) on the front side thereof to polish an end surface of a workpiece, a support mechanism (30) for supporting a back surface (20b) of the polishing disk (20) while allowing the polishing disk (20) to move along a predetermined plane, a workpiece holder (50) for holding the workpiece so as to contact the end surface of the workpiece with the polishing surface of the polishing disk, and a driving mechanism (70) for concurrently causing circular and reciprocating rectilinear motions of the polishing disk (20).</p>
申请公布号 JP5714932(B2) 申请公布日期 2015.05.07
申请号 JP20110031308 申请日期 2011.02.16
申请人 发明人
分类号 B24B19/00;B24B41/06 主分类号 B24B19/00
代理机构 代理人
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