摘要 |
<p>Provided is a polishing apparatus capable of maintaining polishing precision although fewer expendable parts are periodically replaced. The polishing apparatus includes a polishing disk (20) having a polishing surface (20a) on the front side thereof to polish an end surface of a workpiece, a support mechanism (30) for supporting a back surface (20b) of the polishing disk (20) while allowing the polishing disk (20) to move along a predetermined plane, a workpiece holder (50) for holding the workpiece so as to contact the end surface of the workpiece with the polishing surface of the polishing disk, and a driving mechanism (70) for concurrently causing circular and reciprocating rectilinear motions of the polishing disk (20).</p> |