| 摘要 |
PROBLEM TO BE SOLVED: To provide liquid crystal exposure equipment in which the output responce characteristics of a light source are excellent without deteriorating the productivity of the equipment.SOLUTION: Provided is exposure equipment comprising: a main light source 201 of emitting exposure light to the substrate to be exposed, an auxiliary light source 202 whose output response characteristics are different from those of the main light source, a photoelectric sensor 208 of detecting the injection light of the main light source and the auxiliary light source and an exposure amount control part 219 of changing the intensity of the exposure light emitted to the substrate to be exposed. |
