摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for processing a molybdenum-exposed substrate, capable of further suppressing corrosion of molybdenum exposed on a substrate surface.SOLUTION: A method of the present invention can be achieved by a substrate processing device 1 having a processing chamber 2 in which a substrate W is disposed and to which a substrate processing liquid for processing the substrate W is supplied. The device includes: an inert gas filling mechanism (18, 39, 41) for filling with inert gas the interior of the processing chamber 2 in which the substrate W is disposed; a catalytic unit 21 filled with a platinum-group metal catalyst allowing hydrogen-dissolved water to pass therethrough, the hydrogen-dissolved water comprising ultra-pure water added with hydrogen; and a membrane separation unit 22 allowing a hydrogen-dissolved processing liquid to pass, the hydrogen-dissolved processing liquid being obtained by passing the hydrogen-dissolved water through the catalytic unit 21. The hydrogen-dissolved processing liquid passing through the membrane separation unit 22 is supplied as the substrate processing liquid toward the processing chamber 2.</p> |