发明名称 METHOD OF PRODUCING GRAPHENE FROM LIQUID METAL
摘要 A multilayered plate containing, as the graphene forming matrix, an external layer composed of a metal or a metal alloy and, as a support substrate, the transition metals and/or their alloys and/or metalloids and/or their solutions and compounds is subjected to heat treatment in the following stages: plate heating until the plate reaches a temperature that is between 0.5° C. and 50° C., annealing, at a constant or variable temperature from the temperature range, for a period between 60 and 600 seconds and cooling, with the cooling rate maintained between 0.1 and 2° C./min in the temperature range of 1,200° C.-1,050° C.
申请公布号 US2015122659(A1) 申请公布日期 2015.05.07
申请号 US201314069731 申请日期 2013.11.01
申请人 KULA Piotr;RZEPKOWSKI Antoni;PIETRASIK Robert;ATRASZKIEWICZ Radomir;DYBOWSKI Konrad;MODRZYK Wojciech 发明人 KULA Piotr;RZEPKOWSKI Antoni;PIETRASIK Robert;ATRASZKIEWICZ Radomir;DYBOWSKI Konrad;MODRZYK Wojciech
分类号 C25D21/04;C23C14/35;C25D21/02;C25D3/38 主分类号 C25D21/04
代理机构 代理人
主权项 1. A method for producing a graphene layer from a liquid metal matrix on a solid metal or ceramic substrate, wherein a multilayered plate containing, as the graphene forming matrix, an external layer composed of a metal or a metal alloy with a melting point in the range from 1,051° C. and 1,150° C. and, as a support substrate, between 1 and 5 layers made of transition metals and/or their alloys and/or metalloids and/or their solutions and compounds with melting points in the range from 1,151° C. to 3,410° C., is subjected to heat treatment in the following stages: plate heating until the plate reaches a temperature that is between 0.5° C. and 50° C. higher than the melting point of the forming matrix, annealing, at a constant or variable temperature from the temperature range, for a period between 60 and 600 seconds, concurrently supplying the atmosphere with acetylene at a partial pressure of between 0 and 4 hPa, ethylene at a partial pressure of between 0 and 4 hPa and hydrogen at a partial pressure of between 0 and 2 hPa for a period between 10 and 300 seconds, cooling, partially controlled, with the cooling rate maintained between 0.1 and 2° C./min in the temperature range of 1,200° C.-1,050° C., where consecutive stages of heating, annealing and cooling are conducted in the atmosphere of pure argon at a constant partial pressure varying from 1 hPa to 1,100 hPa.
地址 Lodz PL