| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition and a polishing method more suitable for use in application of polishing an object to be polished having a layer containing polysilicon and to provide a method for producing a substrate.SOLUTION: There is provided a polishing composition which is used for polishing an object to be polished having a layer containing polysilicon, contains abrasive grains and an oxidant and has a pH of 6 or more. A colloidal silica is preferably used as the abrasive grains. In addition, the present method provides a step of polishing an object to be polished having a layer containing polysilicon using the polishing composition. In addition, the method for producing a substrate comprises a step of polishing a substrate having a layer containing polysilicon. |
