| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having a good profile can be produced.SOLUTION: The resist composition comprises a resin having an acid labile group, an acid generator, a compound having at least one sulfide bond and at least one mercapto group, and a solvent. The compound having at least one sulfide bond and at least one mercapto group is preferably a heterocyclic compound having at least one sulfide bond and one mercapto group, and more preferably, a compound expressed by formula (IA). In formula (IA), Rrepresents an aliphatic hydrocarbon group having 1 to 10 carbon atoms or an aromatic hydrocarbon group having 6 to 14 carbon atoms; Rand Reach independently represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 10 carbon atoms, or an aromatic hydrocarbon group having 6 to 14 carbon atoms; A and B each independently represent a nitrogen atom or a carbon atom; and n and m each independently represent 0 or 1. |
