发明名称 Method for forming metal circuit, liquid trigger material for forming metal circuit and metal circuit structure
摘要 A metal circuit structure, a method for forming a metal circuit and a liquid trigger material for forming a metal circuit are provided. The metal circuit structure includes a substrate, a first trigger layer and a first metal circuit layer. The first trigger layer is disposed on the substrate and includes a first metal circuit pattern. The first metal circuit layer is disposed on the first circuit pattern and is electrically insulated from the substrate. The composition of the first trigger layer includes an insulating gel and a plurality of trigger particles. The trigger particles are at least one of organometallic particles, a chelation and a semiconductor material having an energy gap greater than or equal to 3 eV. The trigger particles are disposed in the insulating gel, such that the dielectric constant of the first trigger layer after curing is between 2 and 6.5.
申请公布号 EP2869309(A1) 申请公布日期 2015.05.06
申请号 EP20140177426 申请日期 2014.07.17
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 KAO, TUNE-HUNE;HUANG, MENG-CHI;CHOU, MIN-CHIEH
分类号 H01B1/14;H05K1/09;H05K3/18;H05K3/24;H05K3/46 主分类号 H01B1/14
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