发明名称 Acidic solution containing a polyvinylammonium compound and method of electrolytically depositing a copper deposit
摘要 <p>The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acid solution, said polyvinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices l and m are present in the neutral form.</p>
申请公布号 EP1856167(B1) 申请公布日期 2015.05.06
申请号 EP20060723262 申请日期 2006.03.01
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 DAHMS, WOLFGANG;HARTMANN, PHILIP;GRIESER, UDO
分类号 C25D3/38;C08F8/02;C08F8/12;C08F8/44;C08F26/02;C08F226/02;H05K3/42 主分类号 C25D3/38
代理机构 代理人
主权项
地址