发明名称 |
Acidic solution containing a polyvinylammonium compound and method of electrolytically depositing a copper deposit |
摘要 |
<p>The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acid solution, said polyvinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices l and m are present in the neutral form.</p> |
申请公布号 |
EP1856167(B1) |
申请公布日期 |
2015.05.06 |
申请号 |
EP20060723262 |
申请日期 |
2006.03.01 |
申请人 |
ATOTECH DEUTSCHLAND GMBH |
发明人 |
DAHMS, WOLFGANG;HARTMANN, PHILIP;GRIESER, UDO |
分类号 |
C25D3/38;C08F8/02;C08F8/12;C08F8/44;C08F26/02;C08F226/02;H05K3/42 |
主分类号 |
C25D3/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|