Stage apparatus and process apparatus

摘要

According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.

主权项

1. A process apparatus comprising:
a height control unit provided under a lower surface of a substrate, the height control unit comprising height control elements each of which is driven in an upward/downward direction independently; a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas; a control unit which controls the height control unit and the measuring unit; and a material supplying unit which forms a functional material layer on the upper surface of the substrate, wherein the control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in an allowable range, and set the height of the area that is out of the allowable range again by the height control elements, and the control unit is configured to form the functional material layer on the upper surface of the substrate using the material supplying unit.