发明名称 |
Semiconductor molding chamber |
摘要 |
A system and method for a semiconductor molding chamber is disclosed. An embodiment comprises a top molding portion and a bottom molding portion that form a cavity between them into which a semiconductor wafer is placed. The semiconductor molding chamber has a first set of vacuum tubes which hold and fix the position of the semiconductor wafer and a second set of vacuum tubes which evacuate the cavity of extraneous ambient gasses. The encapsulant may then be placed over the semiconductor wafer in order to encapsulate the semiconductor wafer. |
申请公布号 |
US9023266(B2) |
申请公布日期 |
2015.05.05 |
申请号 |
US201313962639 |
申请日期 |
2013.08.08 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lin Jing-Cheng;Chiou Wen-Chih;Jeng Shin-Puu;Yu Chen-Hua |
分类号 |
H01L21/56;H01L21/67;H01L23/31;H01L23/00 |
主分类号 |
H01L21/56 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method for encapsulating a semiconductor device, the method comprising:
providing a semiconductor device with a top surface and a bottom surface; positioning the bottom surface adjacent to a first mold portion comprising a separation component which separates a first pressure region adjacent to the bottom surface and a second pressure region adjacent to the top surface; reducing a pressure in the first pressure region along the bottom surface to affix the bottom surface to the first mold portion; positioning a second mold portion over the first mold portion and the semiconductor device, the second mold portion and the first mold portion defining a cavity enclosing the semiconductor device; evacuating gasses in the second pressure region adjacent to the top surface of the semiconductor device through a first vacuum hole; and applying an encapsulant to the top surface of the semiconductor device. |
地址 |
Hsin-Chu TW |