Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent

摘要

The invention provides an antistatic treatment agent having an ability of preventing resist film thinning phenomenon in a chemically amplified resist, an antistatic film, a coated article and a pattern forming method using such antistatic treatment agent, in particular, the invention provides an antistatic treatment agent comprising an aqueous solvent-soluble electroconductive polymer, a diamine (divalent) or polyamine (polyvalent) aliphatic basic compound and an anionic surfactant, an antistatic film, a coated article and a pattern forming method using such antistatic treatment agent. As the aqueous solvent-soluble electroconductive polymer, a π-conjugated electroconductive polymer having a Brönsted acid group is a sulfonic acid group is preferred and it is preferable that the amount of the diamine (divalent) or polyamine (polyvalent) aliphatic basic compound be from 0.1 to 75 mol % based on the total number of moles of the basic compounds.

主权项

1. A method of performing photolithography, comprising:
a step of forming an antistatic film by applying an antistatic treatment agent comprising (a) an aqueous solvent-soluble electroconductive polymer having a Brönsted acid group, (b) a diamine or polyamine aliphatic basic compound and (c) a volatile basic compound onto a resist sensitive to a charged-particle-beam, and a step of drawing patterns by radiating a charged-particle-beam onto the resist having applied thereon the antistatic treatment agent, wherein the molar ratio of diamine or polyamine aliphatic basic compound in the total mole number of all basic compounds present is within a range of 0.1 to 75 mol %, and the number of moles of the basic group contained in the diamine or polyamine aliphatic basic compound is within a range of 0.05 to 50 mol % based on the number of moles of the Brönsted acid group contained in the aqueous solvent-soluble electroconductive polymer, and wherein the diamine or polyamine aliphatic basic compound consists of one or more kinds selected from the group consisting of diaminoalkane, triaminoalkane, polyaminoalkane and polyalkylimine.