发明名称 Thin-film transistor element and method for producing same, organic EL display element and method for producing same, and organic EL display device
摘要 A thin film transistor element includes: a gate electrode; a source electrode and a drain electrode; an insulating layer; partition walls; and an organic semiconductor layer. The partition walls define a first aperture. Within the first aperture, at least a part of the source electrode and at least a part of the drain electrode are in contact with the semiconductor layer. The partition walls have side face portions facing the first aperture, and some of the side face portions have gentler slopes than the rest of the side face portions.
申请公布号 US9024449(B2) 申请公布日期 2015.05.05
申请号 US201314059559 申请日期 2013.10.22
申请人 Panasonic Corporation 发明人 Okumoto Yuko;Miyamoto Akihito;Ukeda Takaaki
分类号 H01L29/40;H01L21/4763;H01L51/52;H01L27/12;H01L27/32;H01L51/05;H01L51/56 主分类号 H01L29/40
代理机构 Greenblum & Bernstein, P.L.C. 代理人 Greenblum & Bernstein, P.L.C.
主权项 1. A thin film transistor element comprising: a gate electrode; an insulating layer disposed on the gate electrode; a source electrode and a drain electrode disposed on the insulating layer with a gap therebetween; partition walls surrounding at least a part of the source electrode and at least a part of the drain electrode, the partition walls having liquid-repellant surfaces and defining a first aperture; and an organic semiconductor layer disposed on the source electrode and the drain electrode within the first aperture so as to cover the source electrode and the drain electrode and fill the gap between the source electrode and the drain electrode, the organic semiconductor layer being in contact with the source electrode and the drain electrode, wherein the partition walls have side face portions facing of the first aperture, and some of the side face portions have gentler slopes than the rest of the side face portions.
地址 Osaka JP
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