发明名称 Resist composition, method of forming resist pattern, polymeric compound, and compound
摘要 A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).;
申请公布号 US9023581(B2) 申请公布日期 2015.05.05
申请号 US201113703865 申请日期 2011.06.14
申请人 Tokyo Ohka Kogyo Co., Ltd 发明人 Kawaue Akiya;Dohtani Kazushige;Utsumi Yoshiyuki;Iwashita Jun;Konno Kenri;Shiono Daiju;Takaki Daichi
分类号 G03F7/004;G03F7/30;C07C69/54;C08F220/38;G03F7/027;C07C309/04;C07C309/09;C07C309/10;C07C309/12;C07C311/48;C07C311/51;C07C381/12;C08F20/38;G03F7/039;G03F7/20 主分类号 G03F7/004
代理机构 Knobbe Martens Olsen & Bear LLP 代理人 Knobbe Martens Olsen & Bear LLP
主权项 1. A resist composition which exhibits changed solubility in an alkali developing solution upon exposure, comprising: a polymeric compound (A) having a structural unit (a0) represented by general formula (a0) shown below:wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a divalent aromatic cyclic group; each of R2 and R3 independently represents an aryl group with or without a substituent, an alkyl group with or without a substituent or an alkenyl group with or without a substituent, wherein R2 and R3 may be mutually bonded to form a ring with the sulfur atom; L1 represents a single bond or a divalent linking group; and A represents an anion represented by general formula (11a), (11b), (11c), (11e), (11f), (12a), (12b), (12c), (12d) or (2) shown below:wherein in formula (11a), X10 represents an —S(═O)2— containing cyclic group, p represents an integer of 1 to 3, and Q12 represents a single bond or an alkylene group; in formula (11b), X10 represents a hydrocarbon group of 3 to 30 carbon atoms with or without a substituent, p represents an integer of 1 to 3, and Q13 represents an alkylene group; in formula (11c), p represents an integer of 1 to 3, X10′ represents a fluorinated aryl group with or without a substituent, and Q14 represents a single bond or an alkylene group; in formula 11e), X10 represents a hydrocarbon group of 3 to 30 carbon atoms with or without a substituent, p represents an integer of 1 to 3, Q16 represents an alkylene group, and Q17 represents a methylene group; in formula (11f), X10 represents a hydrocarbon group of 3 to 30 carbon atoms with or without a substituent, p represents an integer of 1 to 3, and Q13′ represents an alkylene group in the formulae (12a), (12b), (12c) and (12d), R7″ represents a substituent, w01 represents an integer of 0 to 7, w02 represents an integer of 0 to 5, w03 represents an integer of 0 to 15, each of v01 to v04 independently represents an integer of 0 to 5, and pp represents an integer of 1 to 3; and in formula (2), R6 represents an alkyl group with or without a substituent or a fluorinated alkyl group with or without a substituent; L3 represents a single bond or a divalent linking group; Y10 represents a —CO—; and R7 represents a hydrocarbon group with or without a substituent.
地址 Kawasaki-shi JP