| 主权项 |
1. An actinic-ray- or radiation-sensitive resin composition comprising any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid, wherein R1 represents an optionally substituted aryl group, an optionally substituted alkyl group, an optionally substituted aralkyl group or an optionally substituted mono- or polycycloalkyl group; R2 represents a group having a monocycloalkyl skeleton; R3 represents an alkyl group or an electron withdrawing group; X− represents a counter anion; and n is 0 or 1, m is an integer of 1 to 3, l=3−m, o is an integer of 1 to 7, and p is an integer of 0 to 6, provided that when l is 2, two R1s may be identical to or different from each other, and may be bonded to each other to thereby form a ring, and that R2s, R3s, and n's may be identical to or different from each other, and at least one R2 is an alkoxy group having a total of 7 or more carbon atoms in which a monocycloalkyl group is contained, the at least one R2 is substituted at a para position of an aromatic ring substituted with S+, and the para position is defined with respect to a substituting position of S+. |
