发明名称 |
Actuator including magnet for a projection exposure system and projection exposure system including a magnet |
摘要 |
The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection. |
申请公布号 |
US9025128(B2) |
申请公布日期 |
2015.05.05 |
申请号 |
US201113196592 |
申请日期 |
2011.08.02 |
申请人 |
Carl Zeiss SMT GmbH |
发明人 |
Werber Armin;Muehlberger Norbert;Czap Almut;Fischer Juergen |
分类号 |
G03F7/20;G02B26/08;G02B27/00;H01F7/02;H01F7/16 |
主分类号 |
G03F7/20 |
代理机构 |
Fish & Richardson P.C. |
代理人 |
Fish & Richardson P.C. |
主权项 |
1. A projection exposure system, comprising:
an actuator for a mirror of a micromirror array, the actuator comprising a completely encapsulated magnet; a magnet holding plate; and a manipulator having a surface at least partially held in the magnet holding plate via a connection selected from the group consisting of a monolithic connection and a connection bonded with material continuity without additional connection material, wherein:
the magnet is encapsulated by a capsule housing that is a component selected from the group consisting of a monolithic component and a component bonded with material continuity of at least one of the magnet holding plate and the manipulator; andthe projection exposure system is a microlithography projection exposure system. |
地址 |
Oberkochen DE |