发明名称 Actuator including magnet for a projection exposure system and projection exposure system including a magnet
摘要 The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.
申请公布号 US9025128(B2) 申请公布日期 2015.05.05
申请号 US201113196592 申请日期 2011.08.02
申请人 Carl Zeiss SMT GmbH 发明人 Werber Armin;Muehlberger Norbert;Czap Almut;Fischer Juergen
分类号 G03F7/20;G02B26/08;G02B27/00;H01F7/02;H01F7/16 主分类号 G03F7/20
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A projection exposure system, comprising: an actuator for a mirror of a micromirror array, the actuator comprising a completely encapsulated magnet; a magnet holding plate; and a manipulator having a surface at least partially held in the magnet holding plate via a connection selected from the group consisting of a monolithic connection and a connection bonded with material continuity without additional connection material, wherein: the magnet is encapsulated by a capsule housing that is a component selected from the group consisting of a monolithic component and a component bonded with material continuity of at least one of the magnet holding plate and the manipulator; andthe projection exposure system is a microlithography projection exposure system.
地址 Oberkochen DE