发明名称 Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
摘要 A photosensitive polymer includes a repeating unit represented by Formula 1 and the photosensitive polymer has a weight average molecule weight of from about 3,000 to about 50,000:;
申请公布号 US9023582(B2) 申请公布日期 2015.05.05
申请号 US201313795268 申请日期 2013.03.12
申请人 Samsung Display Co., Ltd. 发明人 Choi Sang-Jun
分类号 G03F7/20;C08G63/66;G03F7/004;G03F7/039 主分类号 G03F7/20
代理机构 Lee & Morse, P.C. 代理人 Lee & Morse, P.C.
主权项 1. A photosensitive polymer, comprising: a repeating unit represented by Formula 1, the photosensitive polymer having a weight average molecule weight of from about 3,000 to about 50,000: wherein, in Formula 1, Ar1 is selected from among: a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group, anda C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, a C1-C20 alkoxy group, a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C2-C10 heterocycloalkyl group, a C2-C10 heterocycloalkenyl group, a C6-C20 aryl group, and a C2-C20 heteroaryl group; Ar2 is selected from among: —C(═O)—, —O—, a C1-C20 alkylene group, a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group, anda C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, a C1-C20 alkoxy group, a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C2-C10 heterocycloalkyl group, a C2-C10 heterocycloalkenyl group, a C6-C20 aryl group, and a C2-C20 heteroaryl group; a and b are each independently an integer from 1 to 5, provided that: when a is 2 or greater, the Ar1 in (Ar1)a are the same or different from each other, andwhen b is 2 or greater, the Ar2 in (Ar2)b are the same or different from each other; and R1 to R4 are each independently selected from among: a hydrogen atom, a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, C1-C20 alkyl group, C1-C20 alkoxy group,a C1-C20 alkyl group and a C1-C20 alkoxy group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C6-C20 aryl group, and a C2-C20 heteroaryl group,a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C3-C10 heterocycloalkyl group, a C3-C10 heterocycloalkenyl group, a C6-C60 aryl group, a C6-C60 aryloxy group, a C6-C60 arylthio group, and a C2-C60 heteroaryl group, anda C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C3-C10 heterocycloalkyl group, a C3-C10 heterocycloalkenyl group, a C6-C60 aryl group, a C6-C60 aryloxy group, a C6-C60 arylthio group, and a C2-C60 heteroaryl group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, and a C1-C20 alkoxy group.
地址 Yongin, Gyunggi-Do KR