| 发明名称 | Method of forming polymeric compound, resist composition and method of forming resist pattern | ||
| 摘要 | A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO2— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from a monomer that generates acid upon exposure, wherein the copolymerizing is conducted in the presence of 0.001 to 1.0 mol % of a basic compound, based on the monomer containing an —SO2— containing cyclic group. | ||
| 申请公布号 | US9023580(B2) | 申请公布日期 | 2015.05.05 |
| 申请号 | US201213683263 | 申请日期 | 2012.11.21 |
| 申请人 | Tokyo Ohka Kogyo Co., Ltd. | 发明人 | Shiono Daiju;Hirano Tomoyuki;Dazai Takahiro |
| 分类号 | G03F7/039;C08F2/38;G03F7/004;C08F28/06;G03F7/11;G03F7/20 | 主分类号 | G03F7/039 |
| 代理机构 | Knobbe Martens Olson & Bear LLP | 代理人 | Knobbe Martens Olson & Bear LLP |
| 主权项 | 1. A method of producing a polymeric compound, comprising: copolymerizing a monomer containing an —SO2— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from a monomer that generates acid upon exposure, wherein the copolymerizing is conducted in the presence of 0.001 to 1.0 mol % of a basic compound, based on the monomer containing an —SO2— containing cyclic group, and the basic compound is an amine in which at least one hydrogen atom of NH3 has been substituted with a chain alkyl group or hydroxyalkyl group of no more than 12 carbon atoms. | ||
| 地址 | Kawasaki-shi JP | ||