| 摘要 |
Disclosed is a batch type apparatus for processing a substrate. The batch type apparatus for processing a substrate according to the present invention, which is capable of processing multiple substrates (50), includes a main body (100) which includes a chamber (110) providing a substrate processing space for the substrates (50); and heater units (200) which are arranged on the entire outside of the chamber (110). The heater units (200) include unit heaters (201) which are arranged with constant intervals. |
