APPARATUS FOR TREATING SUBSTRATE

摘要

According to an embodiment of the present invention, provided is an apparatus for heating and treating a substrate. The apparatus for treating the substrate comprises: a substrate supporting unit supporting the substrate; a medicinal fluid supply unit having a nozzle supplying medicinal fluid on the substrate supported on the substrate supporting unit; and a heating unit radiating light and heating the substrate supported on the substrate supporting unit. Since a heating member heats the substrate before the medicinal fluid is supplied on the substrate, temperature difference between the substrate and the medicinal fluid can be decreased.