涂布膜形成装置、涂布膜形成方法、记忆媒体;COATING FILM FORMING APPARATUS, COATING FILM FORMING METHOD, AND RECORDING MEDIUM

摘要

在基板形成涂布膜时，提高生产率并且提高基板面内之涂布膜之膜厚的均匀性。以具备下述来构成装置，提高前述膜厚的均匀性，其包括：基板保持部，水平地保持基板；旋转机构，使保持于前述基板保持部的基板旋转；涂布液供给机构，为了在前述基板形成涂布膜而供给涂布液；环状构件，为了在前述基板之旋转所进行之涂布液之液膜的乾燥时，对基板之周缘部上方的气流进行整流，而以覆盖基板之周缘部上方的方式，沿着基板之圆周方向设成为环状；及突起部，为了减少前述环状构件之内周端附近之朝向气流正下方的成分，而在前述环状构件的内周缘部沿着圆周方向而设，且向上方突出。; a rotating mechanism to rotate the substrate held by the substrate holding unit; a coating liquid supplying mechanism to supply coating liquid to form a coating film on the substrate; an annular member to rectify a gas stream above a periphery of the substrate when liquid film of the coating liquid is dried by rotation of the substrate, the annular member being provided above the periphery of the substrate and along a circumferential direction of the substrate so as to cover the periphery of the substrate; and a protrusion provided on an inner periphery of the annular member along circumferential direction of the annular member so as to protrude upward to reduce component of the gas stream flowing directly downward near an inner peripheral edge of the annular member.