图案形成方法、电子元件的制造方法以及电子元件;PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE

摘要

本发明的图案形成方法顺次包含：(1)形成以照射光化射线或放射线为契机而使极性增大的膜的步骤；(2)对该膜进行第1图案曝光，于进行了第1图案曝光的膜上形成高感光部、中间感光部及低感光部的步骤；(3)使用第1显影液、及第2显影液的其中一种，对进行了第1图案曝光的膜进行显影而形成第1图案的步骤；(4)对第1图案进行与第1图案曝光的光学影像不同的第2图案曝光的步骤；(5)使用第1显影液及第2显影液的另一种，对进行了第2图案曝光的膜进行显影，形成第2图案的步骤。; (2) a step of forming a high-photosensitive part, a medium-photosensitive part, and a low-photosensitive part on an exposed first pattern film by performing a first pattern exposure on the film; (3) a step of using one of the a first developer and a second developer to develop the film on which the first-pattern exposure is performed, so as to form a first pattern; (4) a step of performing a second-pattern exposure on the first pattern, wherein optical images of the first-pattern exposure and the second-pattern exposure are different; (5) a step of using the unused developer of the first and second developers to develop the film on which the second-pattern exposure is performed, so as to form a second pattern.