具有主动对准之卷对卷无光罩微影;ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT

摘要

本发明的实施例系关于利用主动对准而在挠性基板上进行无光罩微影的设备与方法。在一实施例中，一种微影设备包括一圆柱形滚轴，该圆柱形滚轴可绕着一中心轴旋转并且配置来在一圆柱形基板支撑表面上转移一挠性基板。复数个印刷单元的每一者包括一影像感测装置与一影像印刷装置，复数个印刷单元可定位成面向该基板支撑表面。当该挠性基板正被连续地转移时，该复数个印刷单元可撷取该挠性基板上的标记及/或预先存在的图案的影像，且根据该撷取的影像，可「即时(on-the-fly)」调整用于每一印刷单元的曝光图案，因此达成主动对准。 Embodiments of the present invention relates to apparatus and methods for a maskless lithography on a flexible substrate with active alignment. In one embodiment, a lithography apparatus includes a cylindrical roller rotatable about a central axis and configured to transfer a flexible substrate on a cylindrical substrate supporting surface. A plurality of printing units, each includes an image sensing device and an imaging printing device, may be positioned facing the substrate supporting surface. The plurality of printing units may capture images of pre-existing patterns and/or markers on the flexible substrate as the flexible substrate is being transferred continuously and exposure patterns for each printing unit may be adjusted “on-the-fly”