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发明名称
选择性蚀刻氮化钛之组成物及方法;COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE
摘要
自其上具有氮化钛及/或光阻蚀刻残余物料之一微电子装置相对于绝缘材料选择性去除该等材料之有用的组成物。该等去除组成物含有至少一种氧化剂、一种蚀刻剂、及一种活化剂以提升氮化钛之蚀刻速率。
申请公布号
TW201516129
申请公布日期
2015.05.01
申请号
TW103130065
申请日期
2014.08.29
申请人
先进科技材料公司 ADVANCED TECHNOLOGY MATERIALS, INC.
发明人
库帕 艾曼纽 COOPER, EMANUEL I.;陈立民 CHEN, LI MIN;里皮 史帝芬 LIPPY, STEVEN;许佳荣 HSU, CHIA JUNG;涂胜宏 TU, SHENG HUNG;王洁如 WANG, CHIEH JU
分类号
C09K13/00(2006.01);H01L21/3065(2006.01)
主分类号
C09K13/00(2006.01)
代理机构
代理人
赖经臣宿希成
主权项
地址
美国 US;
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