| 摘要 |
PROBLEM TO BE SOLVED: To control drive of a substrate stage with good accuracy.SOLUTION: An exposure device 100 comprises: a substrate stage WST which includes a table WTB for loading a substrate W and a body part 91 for supporting the table WTB in a non-contact manner, and which is arranged on a base 12; an encoder system which includes a plurality of heads (60C etc.) which are provided on the table WTB and each of which irradiates measurement beams on a grating part RG supported by a frame, and measures positional information of the table by the heads opposite to the grating part among the plurality of heads; and a control unit for controlling drive of the substrate stage WST on the basis of displacement information of the heads used for measurement of the positional information (or correction information for compensating for a measurement error of the encoder system caused by displacement of the heads) and the positional information measured by the encoder system. |
