发明名称 In-Situ Capping with No Loss of Water Depth
摘要 A method of remediating contaminated sediment area. The sediment has an initial water depth and comprises water and fine-grained solids. The contaminated sediment is contained in place by installing over the contaminated sediment an in-situ cap having a total thickness TCP. The contaminated sediment, and optionally any uncontaminated subsurface, is then consolidated until the total settlement of the contaminated and uncontaminated sediment exceeds the thickness TCP of the in-situ cap. The sediment is consolidated by installing a vertical barrier along the perimeter of the contaminated sediment area, installing a plurality of horizontal line drains into the sediment, connecting the horizontal line drains to a vacuum source, installing an in-situ cap over the contaminated sediment area and over the upper edge of the vertical barrier, and applying vacuum pressure to the horizontal line drains to dewater and consolidate the sediment.
申请公布号 US2015117954(A1) 申请公布日期 2015.04.30
申请号 US201514589722 申请日期 2015.01.05
申请人 Hwang Daekyoo 发明人 Hwang Daekyoo
分类号 B09C1/00;B09C1/02;B09C1/08 主分类号 B09C1/00
代理机构 代理人
主权项 1. A method of remediating contaminated sediment overlying an uncontaminated subsurface, the sediment having an initial water depth and comprising water and fine-grained solids and an initial water depth DW1, comprising the steps of: a) containing the contaminated sediment in place by installing over the contaminated sediment an in-situ cap having a total thickness TCP; and, b) consolidating at least one of the contaminated sediment and the uncontaminated sediment until the total settlement of the contaminated and uncontaminated sediment exceeds the thickness TCP of the in-situ cap.
地址 West Chester PA US