| 摘要 |
<p>The present invention relates to a substrate processing apparatus which can remove particles inside a substrate processing room. The substrate processing apparatus according to an embodiment of the present invention comprises: a chamber housing having a substrate processing room composed of a bottom wall, an upper wall, and a side wall connecting the bottom wall and the upper wall; a substrate stage movable in a first axial direction and a second axial direction intersecting therewith inside the substrate processing room; and a lower exhaust body discharging an air current existing between the substrate stage and a bottom wall of the chamber housing to the outside.</p> |
