| 摘要 |
<p>TO PROVIDE A STRUCTURE FOR MOUNTING A NOVEL REACTION TUBE, WHICH IS CAPABLE OF FOLLOWING UP THE THERMAL EXPANSION OF THE REACTION TUBE WITHOUT THE NEED OF HANGING DOWN THE REACTION TUBE IN THE APPARATUS FOR PRODUCING SILICON.IN A REACTION UNIT 3 IN A REACTION VESSEL BODY 2 OR THE APPARATUS 1 FOR PRODUCING SILICON, THERE ARE PROVIDED A GAS FEED PIPE 6 FOR FEEDING CHIOROSILANES AND HYDROGEN, A REACTION TUBE 7 FOR PRECIPITATING SILICON, A HIGH-FREQUENCY COIL 11 ARRANGED ON THE OUTER CIRCUMFERENTIAL SIDE OF THE REACTION TUBE 7 TO MELT THE PRECIPITATED SILICON, A HEAT INSULATING MATERIAL 9 PROVIDED BETWEEN THE REACTION TUBE 7 AND THE HIGH-FREQUENCY COIL 11, AND AN INTERMEDIATE WALL 8 PROVIDED AT THE LOWER PORTION OF THE REACTION UNIT 3 TO SUPPORT THE HEAT INSULATING MATERIAL 9.THE REACTION TUBE 7 IS SUPPORTED ON THE UPPER SURFACE OF THE INTERMEDIATE WALL 8.</p> |
