| 摘要 |
The present invention relates to a high-performance functional film, such as a gas barrier film with a high gas barrier performance, which uses an inexpensive support and is manufactured at a low cost and a high productivity. According to the functional film of the present invention which is formed by laminating a coating-based organic layer and an inorganic layer based on a vapor phase deposition method, a glass transition temperature of the organic layer is at least 100°C, and a thickness thereof is between 0.05 µm and 3 µm. The organic layer is coated with at least 5 cc/m 2 of a coating material, and formed for a viscosity in a falling-rate drying state to be at least 20 cP and for a surface tension to be 34 dyn/cm or less. The inorganic layer is formed at a surface of the organic layer by a vapor phase film formation method for plasma generation. |
