Reflective Optical Element

摘要

A reflective optical element for a microlithographic projection exposure apparatus, a mask inspection apparatus or the like. The reflective optical element has an optically effective surface, an element substrate (12, 32, 42, 52), a reflection layer system (14, 34, 44, 54) and at least one deformation reduction layer (15, 35, 45, 55, 58). When the optically effective surface (11, 31, 41, 51) is irradiated with electromagnetic radiation, a maximum deformation level of the reflection layer system is reduced in comparison with a deformation level of an analogously constructed reflective optical element without the deformation reduction layer.

主权项

1. Reflective optical element having an optically effective surface and comprising:
an element substrate; a reflection layer system; at least one deformation reduction layer which, upon the optically effective surface being irradiated with electromagnetic radiation, reduces a maximum deformation level of the reflection layer system in comparison with an analogous construction of a reflective optical element without the deformation reduction layer; and an intermediate layer arranged between the reflection layer system and the deformation reduction layer and configured to block transfer of surface roughnesses to the reflection layer system.