发明名称 |
Semiconductor Device and Method of Forming a Shielding Layer Between Stacked Semiconductor Die |
摘要 |
A semiconductor device has a first semiconductor die with a shielding layer formed over its back surface. The first semiconductor die is mounted to a carrier. A first insulating layer is formed over the shielding layer. A second semiconductor die is mounted over the first semiconductor die separated by the shielding layer and first insulating layer. A second insulating layer is deposited over the first and second semiconductor die. A first interconnect structure is formed over the second semiconductor die and second insulating layer. A second interconnect structure is formed over the first semiconductor die and second insulating layer. The shielding layer is electrically connected to a low-impedance ground point through a bond wire, RDL, or TSV. The second semiconductor die may also have a shielding layer formed on its back surface. The semiconductor die are bonded through the metal-to-metal shielding layers. |
申请公布号 |
US2015115394(A1) |
申请公布日期 |
2015.04.30 |
申请号 |
US201414553358 |
申请日期 |
2014.11.25 |
申请人 |
STATS ChipPAC, Ltd. |
发明人 |
Pagaila Reza A.;Do Byung Tai;Suthiwongsunthorn Nathapong |
分类号 |
H01L23/552;H01L23/50;H01L23/48;H01L21/768;H01L23/00 |
主分类号 |
H01L23/552 |
代理机构 |
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代理人 |
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主权项 |
1. A method of making a semiconductor device, comprising:
providing a first semiconductor die; forming a shielding layer over the first semiconductor die; disposing a second semiconductor die over the shielding layer; and electrically connecting the shielding layer to a ground point. |
地址 |
Singapore SG |