FORMATION METHOD FOR MICROPATTERN, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING DEVICE, AND RECORDING MEDIUM

摘要

A micropattern formation method comprises steps for: core pattern formation, which forms a core pattern of a predetermined linewidth in a substrate front side; sidewall formation, which forms a sidewall for the core pattern formed in the core pattern formation step; and core pattern removal, which, subsequent to the sidewall formation step, using etching gas, removes the core pattern in a state of leaving the sidewall. The micropattern formation method is configured so that, in the core pattern removal step, in parallel with the removal of the core pattern, film deposited on the substrate rear side with the core pattern formation step is removed.