| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing device which allows for uniform processing of a substrate in the in-plane thereof by using light emission of plasma, and to provide a substrate processing method.SOLUTION: A light-emitting panel 5, as a light irradiation unit, internally has a plurality of discharge cells 40, a long discharge electrode 47 provided corresponding to the discharge cells 40, respectively, and a plurality of long address electrodes 53 provided in a direction orthogonal to the discharge electrode 47. Interior of each discharge cell 40 is a plasma generation space for generating plasma. The light-emitting panel 5 generates the ultraviolet rays by a plasma generated in the discharge cell 40, and the processing space S1 in a processing container 1 is irradiated with the ultraviolet rays.</p> |
