| 发明名称 |
DEPOSITION APPARATUS |
| 摘要 |
An exemplary embodiment of the present invention provides a deposition apparatus including: a substrate support for supporting a substrate; a reaction chamber wall defining a reaction chamber and contacting the substrate support; a plurality of gas inlets connected to the reaction chamber wall; a remote plasma unit connected to at least one of the plurality of gas inlets; and a gas-supplying path connected to the plurality of gas inlets and defining a reaction region along with the substrate support. A plurality of gases passing through the plurality of gas inlets move along the gas-supplying path to be directly supplied onto the substrate without contacting other parts of the reactor. |
| 申请公布号 |
US2015114295(A1) |
申请公布日期 |
2015.04.30 |
| 申请号 |
US201414521588 |
申请日期 |
2014.10.23 |
| 申请人 |
ASM IP Holding B.V. |
发明人 |
KIM Young Hoon;KIM Dae Youn;JUNG Dong Rak;CHOI Young Seok;LEE Sang Wook |
| 分类号 |
C23C16/50;C23C16/455;C23C16/44;C23C16/46 |
主分类号 |
C23C16/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A deposition apparatus comprising:
a substrate support for supporting a substrate; a reaction chamber wall defining a reaction chamber and contacting the substrate support; a plurality of gas inlets connected to the reaction chamber wall; a remote plasma unit connected to at least one of the plurality of gas inlets; and a gas-supplying path connected to the plurality of gas inlets and defining a reaction region along with the substrate support, wherein a plurality of gases passing through the plurality of gas inlets move along the gas-supplying path to be directly supplied to the substrate without contacting other parts of the reactor. |
| 地址 |
Almere NL |
