ALUMINUM ALLOY, AND SEMICONDUCTOR PRODUCTION DEVICE AND PLASMA TREATMENT DEVICE EACH MANUFACTURED USING SAME

摘要

An aluminum alloy according to the present invention comprises, in wt%, 2.0 to 3.5% of Mg, 0.001 to 0.01% of Cr or 0.005 to 0.01% of Mn, and 0.001 to 0.04% of Ti, with the remainder made up by 0.01% or less of unavoidable impurities and Al.