发明名称 OXIDE SINTERED BODY, OXIDE SPUTTERING TARGET AND CONDUCTIVE OXIDE THIN FILM WITH HIGH REFRACTIVE INDEX, AND METHOD FOR PRODUCING OXIDE SINTERED BODY
摘要 <p>A sintered body which is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), which comprises 2 to 65 mol% of In as In2O3 and 2 to 65 mol% of Ti or Cr as TiO2 or Cr2O3 respectively, and which when an atom ratio of In is A (at%), atom ratio of Ti or Cr is B (at%), and atom ratio of Zn or Sn is C (at%), satisfies 0.5≤A/B≤5 and 0<C/(A+B)<10. A transparent thin film with a high refractive index can be formed which has a low bulk resistance and is capable of DC sputtering.</p>
申请公布号 WO2015059938(A1) 申请公布日期 2015.04.30
申请号 WO2014JP50106 申请日期 2014.01.08
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 NARA ATSUSHI
分类号 C04B35/453;C04B35/457;C23C14/34;G11B7/24;G11B7/254;G11B7/257;H01B5/14 主分类号 C04B35/453
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