| 摘要 |
<p>A mask unit is arranged such that at any location along an X direction with respect to openings (S) of a vapor deposition mask, the length of that portion of openings S which is uncovered by a beam portion totals a constant length along a Y direction in a plan view and that the beam portion has a part in contact with the vapor deposition mask which part does not bridge an opening of a frame portion along the Y direction but extends to cross the Y direction continuously or intermittently.</p> |
