PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD FOR FORMING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photoacid generator which shows good solubility in a solvent and improved exposure latitude and a mask error factor (MEF) in positive tone development, which is highly soluble with a negative tone developer and rendered into poorly soluble upon exposure and post-exposure baking treatment, and which shows improved critical dimension uniformity (CDU) in negative tone development.SOLUTION: A photoacid generator contains a ketal-substituted sulfonium ion represented by 4-(2-oxo-2-(2,2,2',2'-tetramethyl-4,4'-bis(1,3-dioxolan)-5-yl-methoxyethoxy)phenyl)diphenylsulfonium 1,1-difluoro-2-(3-hydroxyadamantan-1-yl-methoxy)-2-oxoethanesulfonate (abbreviated IPXPDPS ADOH-CDFMS (PAG-A2)).