| 发明名称 |
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING TWO TYPES OF CORROSION INHIBITORS |
| 摘要 |
A chemical-mechanical polishing (“CMP”) composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of A/-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group consisting of: (C1) an acetylene alcohol, and (C2) a salt or an adduct of (C2a) an amine, and (C2b) a carboxylic acid comprising an amide moiety, (D) at least one type of an oxidizing agent, (E) at least one type of a complexing agent, and (F) an aqueous medium. |
| 申请公布号 |
US2015118845(A1) |
申请公布日期 |
2015.04.30 |
| 申请号 |
US201214006744 |
申请日期 |
2012.03.19 |
| 申请人 |
Gao Ning |
发明人 |
Noller Bastian;Lauter Michael;Sugiharto Albert Budiman;Li Yuzhuo;Rushing Kenneth;Franz Diana;Boehn Roland |
| 分类号 |
H01L21/321;H01L21/306;C09G1/02 |
主分类号 |
H01L21/321 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemical-mechanical polishing (CMP) composition, comprising:
inorganic particles, organic particles, or a mixture or composite thereof, an N-heterocyclic compound as corrosion inhibitor, a further corrosion inhibitor which is a salt, or adduct of an amine and a carboxylic acid comprising an amide moiety, an oxidizing agent, a complexing agent, and an aqueous medium. |
| 地址 |
Potsdam NY US |
