RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1):;whereinR1 represents a hydrogen atom, a methyl group, or a halogen atom;R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group;L represents a divalent linking group or a single bond;Y represents a substituent excluding a methylol group;Z represents a hydrogen atom or a substituent;m represents an integer of 0 to 4;n represents an integer of 1 to 5; andm+n is 5 or less.

主权项

1. A resin composition comprising a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; m+n is 5 or less; in the case where m is 2 or more, plural Y's may be the same as or different from each other; in the case where n is 2 or more, plural R2's, R3's, and Z's may be the same as or different from each other; and any two or more of Y, R2, R3 and Z may be bonded to each other to form a ring structure.