发明名称 STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACTURING STRAIN AND PRESSURE SENSING DEVICE, AND METHOD FOR MANUFACTURING MICROPHONE
摘要 According to one embodiment, a strain and pressure sensing device includes a semiconductor circuit unit and a sensing unit. The semiconductor circuit unit includes a semiconductor substrate and a transistor. The transistor is provided on a semiconductor substrate. The sensing unit is provided on the semiconductor circuit unit, and has space and non-space portions. The non-space portion is juxtaposed with the space portion. The sensing unit further includes a movable beam, a strain sensing element unit, and first and second buried interconnects. The movable beam has fixed and movable portions, and includes first and second interconnect layers. The fixed portion is fixed to the non-space portion. The movable portion is separated from the transistor and extends from the fixed portion into the space portion. The strain sensing element unit is fixed to the movable portion. The first and second buried interconnects are provided in the non-space portion.
申请公布号 US2015118779(A1) 申请公布日期 2015.04.30
申请号 US201414582295 申请日期 2014.12.24
申请人 Kabushiki Kaisha Toshiba 发明人 FUKUZAWA Hideaki;Ohguro Tatsuya;Kojima Akihiro;Sugizaki Yoshiaki;Takayanagi Mariko;Fuji Yoshihiko;Hori Akio;Hara Michiko
分类号 B81C1/00;G01L9/00 主分类号 B81C1/00
代理机构 代理人
主权项 1. (canceled)
地址 Minato-ku JP