发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an SGT (Surrounding Gate Transistor) having a structure to form a transistor depending on a work function difference between a metal and a semiconductor.SOLUTION: A semiconductor device comprises: a columnar semiconductor with an impurity concentration of 10cmor less; a first insulator which surrounds the columnar semiconductor; a first metal which surrounds the first insulator on one end of the columnar semiconductor; a second metal which surrounds the first insulator on the other end of the columnar semiconductor; a third metal which surrounds the first insulator in a region sandwiched by the first metal and the second metal; a second insulator formed between the first metal and the third metal; a third insulator formed between the second metal and the third metal; a fourth metal which connects the first metal and the one end of the columnar semiconductor; and a fifth metal which connects the second metal and the other end of the columnar semiconductor, in which a work function of the third metal is between a range from 4.2 eV to 5.0 eV. |
申请公布号 |
JP2015084441(A) |
申请公布日期 |
2015.04.30 |
申请号 |
JP20140255450 |
申请日期 |
2014.12.17 |
申请人 |
UNISANTIS ELECTRONICS SINGAPORE PTE LTD |
发明人 |
MASUOKA FUJIO;NAKAMURA HIROKI |
分类号 |
H01L21/336;H01L29/423;H01L29/49;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|