发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an SGT (Surrounding Gate Transistor) having a structure to form a transistor depending on a work function difference between a metal and a semiconductor.SOLUTION: A semiconductor device comprises: a columnar semiconductor with an impurity concentration of 10cmor less; a first insulator which surrounds the columnar semiconductor; a first metal which surrounds the first insulator on one end of the columnar semiconductor; a second metal which surrounds the first insulator on the other end of the columnar semiconductor; a third metal which surrounds the first insulator in a region sandwiched by the first metal and the second metal; a second insulator formed between the first metal and the third metal; a third insulator formed between the second metal and the third metal; a fourth metal which connects the first metal and the one end of the columnar semiconductor; and a fifth metal which connects the second metal and the other end of the columnar semiconductor, in which a work function of the third metal is between a range from 4.2 eV to 5.0 eV.
申请公布号 JP2015084441(A) 申请公布日期 2015.04.30
申请号 JP20140255450 申请日期 2014.12.17
申请人 UNISANTIS ELECTRONICS SINGAPORE PTE LTD 发明人 MASUOKA FUJIO;NAKAMURA HIROKI
分类号 H01L21/336;H01L29/423;H01L29/49;H01L29/78 主分类号 H01L21/336
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