发明名称 分割スパッタリングターゲット及びその製造方法
摘要 <p>The present invention provides a divided sputtering target obtained by joining a plurality of target members, whereby it is possible to effectively prevent contamination of the formed thin formed by the constituent material of the backing plate, as a result of sputtering. The present invention is a divided sputtering target obtained by joining a plurality of target materials on a backing plate by means of low-temperature soldering, wherein a protective member is provided to the backing plate along the gap formed between the joined target members.</p>
申请公布号 JP5711172(B2) 申请公布日期 2015.04.30
申请号 JP20120066787 申请日期 2012.03.23
申请人 发明人
分类号 C23C14/34;H01L21/363 主分类号 C23C14/34
代理机构 代理人
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