| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of an organic process liquid for patterning a chemically amplified resist film, by which generation of particles can be reduced in negative patterning technology using an organic developer, and to provide an organic process liquid for patterning a chemically amplified resist film using the above production method, a pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The production method of an organic process liquid for patterning a chemically amplified resist film includes a step of allowing a liquid containing an organic solvent to pass through a filtration device including a liquid inlet, a liquid outlet, and a filter membrane disposed in a flow passage. An absolute difference between a liquid inlet temperature and a liquid outlet temperature is 3°C or less. In the filtration device, a liquid filtration rate is 0.5 L/min/mor more, and a filtration pressure is 0.1 MPa or less. An organic process liquid for patterning a chemically amplified resist film is obtained by the above method. A patterning method, a method for manufacturing an electronic device, and an electronic device are provided, using the above organic process liquid. |
