发明名称 |
METHOD FOR PRODUCING OXIDE CRYSTAL THIN FILM |
摘要 |
There is provided a thin film manufacturing method which allows both a reduction in the carbon impurity concentration and a high film forming speed, as well as allows separate formation of stable crystal structures. There is provided a method for manufacturing an oxide crystal thin film. The method includes carrying raw material fine particles to a film forming chamber by means of a carrier gas, the raw material fine particles being formed from a raw material solution including water and at least one of a gallium compound and an indium compound, and forming an oxide crystal thin film on a sample on which films are to be formed, the sample being placed in the film forming chamber. At least one of the gallium compound and the indium compound is bromide or iodide. |
申请公布号 |
EP2865789(A1) |
申请公布日期 |
2015.04.29 |
申请号 |
EP20130817842 |
申请日期 |
2013.11.11 |
申请人 |
ROCA K.K. |
发明人 |
ODA, MASAYA;HITORA, TOSHIMI |
分类号 |
H01L21/368;C30B7/14;C30B25/14;C30B29/16 |
主分类号 |
H01L21/368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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