发明名称 Semiconductor device comprising a MOS transistor and method of making the same
摘要 <p>A semiconductor device comprises an active region (1) of a first conductivity type including a transistor structure, and a ring shaped region (20,21,22) of the first conductivity type extending from a surface of the active region into the active region and substantially surrounding the transistor structure to terminate the electric field and reduce leakage current at the boundary of the active region.</p>
申请公布号 EP1515371(B1) 申请公布日期 2015.04.29
申请号 EP20040021508 申请日期 2004.09.09
申请人 INFINEON TECHNOLOGIES AG 发明人 CHEN, QIANG;MA, GORDON
分类号 H01L29/78;H01L21/336;H01L21/762;H01L29/06;H01L29/10 主分类号 H01L29/78
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