发明名称 Manufacturing method of thin film with low process temperature deviation and system thereof
摘要 <p>The present invention relates to a method and a system to manufacture a thin film. More specifically, the invention relates to the method and system to manufacture the thin film which forms a thin film through a plurality of segmented processes to reduce the difference in processing temperatures resulted from the formation of the thin film. The present invention comprises: (a) a step of increasing the temperature of a plate subjected to treatment until the temperature reaches a predefined temperature on which formation of thin film begins; (b) a step of forming a thin film until the temperature of the said plate reaches a predefined upper temperature limit; (c) step of stopping formation of the thin film and cool the said plate down to the predefined temperature at which formation of thin film begins; and (d) step of repeating step (b) and step (c) until the film of the desired thickness is formed. The invention initiates the method to manufacture thin film which features the increase in temperature of the said plate subjected to treatment with heat induced from a source of the thin film to form the said thin film. According to the invention, the thin film is formed through a plurality of processes to reduce the difference in processing temperatures resulted from the formation of thin film, and enables the formation of thin film on a plate made of low-temperature material. Also the invention reduces relative impact of residual impurities with the use of high-powered thin film source to manufacture high-quality thin film.</p>
申请公布号 KR20150045554(A) 申请公布日期 2015.04.29
申请号 KR20130124657 申请日期 2013.10.18
申请人 发明人
分类号 C23C14/22;C23C14/58 主分类号 C23C14/22
代理机构 代理人
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