发明名称 Photoresist composition and method of forming a black matrix using the same
摘要 A photoresist composition includes a binder resin combined with a black dye, a monomer, a photo-polymerization initiator and a remainder of a solvent.
申请公布号 US9017921(B2) 申请公布日期 2015.04.28
申请号 US201313853395 申请日期 2013.03.29
申请人 Samsung Display Co., Ltd. 发明人 Ryu Soo-Hye;Shim Yi-Seop;Jang Chang-soon;Huh Chul
分类号 G03F7/004;G03C1/00;C09D11/00;C09B31/02;C09B69/10;G03F7/20;G03C1/52;C09D11/328 主分类号 G03F7/004
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A photoresist composition, comprising: a binder resin bonded to a black dye; a monomer; a photo-polymerization initiator; and a remainder of a solvent, wherein the binder resin is represented by following Chemical Formula 4, wherein m, n, p and q represents mole fractions of corresponding repeating units, and sum of m, n, p and q is 100, and m, n, p and q are integers more than 0, and R1 represents —OCOCH═CHCH3, and R2 and R3 independently represent —NR5R6, —OR7, —CR8═CR9R10 or —OC(═O)CR11═CR12R13, and R5 to R13 independently represent a hydrogen atom or an alkyl group having carbon atoms of 1 to 5, and at least one hydrogen atoms of the alkyl group may be substituted with an alkyl group having carbon atoms of 1 to 20, an alkoxyl group having carbon atoms of 1 to 30, an aryl group having carbon atoms of 6 to 30 or an aryloxyl group having carbon atoms of 6 to 30,
地址 Yongin, Gyeonggi-Do KR